PRODUCTION METHOD OF PATTERNED RETARDATION FILM, EXPOSURE APPARATUS AND MASK

摘要

PROBLEM TO BE SOLVED: To provide a patterned retardation film to be applied to passive type three-dimensional image display, which can sufficiently block light in an oblique direction compared to the prior arts.SOLUTION: A production method of a patterned retardation film comprises: a photo-aligning material film production step of producing a photo-aligning material film on a transparent film substrate; an exposure step of exposing the photo-aligning material film by use of a mask to produce a photo-aligning film; and a retardation layer production step of producing a retardation layer which comprises a region for a right eye to impart a corresponding retardation to transmitted light for the right eye and a region for a left eye to impart a corresponding retardation to transmitted light for the left eye. The mask 16 comprises a laminate of a thin plate slit part 16A having slits S corresponding to the first region or to the second region, and a light-shielding part 16B having a larger thickness compared to the slit part 16A and having an opening S1 formed wider than the slit S.