发明名称 |
SYSTEMS AND METHODS FOR HANDLING SUBSTRATES AT BELOW DEW POINT TEMPERATURES |
摘要 |
Disclosed systems and methods for testing a device under test (DUT) with a probe system are selected to test a DUT at a temperature below the dew point of the ambient environment surrounding the probe system. Probe systems include a measurement chamber configured to isolate a cool, dry testing environment and a measurement chamber door configured to selectively isolate the internal volume of the measurement chamber. When a DUT, that is or is included on a substrate, is tested at a low temperature, systems and methods are selected to heat the substrate in a dry environment, at least partially isolated from the measurement chamber, to at least a temperature above the dew point and/or the frost point of the ambient environment. |
申请公布号 |
US2014185649(A1) |
申请公布日期 |
2014.07.03 |
申请号 |
US201314141781 |
申请日期 |
2013.12.27 |
申请人 |
Cascade Microtech, Inc. |
发明人 |
Hirschfeld Botho;Becker Axel |
分类号 |
G01N25/66 |
主分类号 |
G01N25/66 |
代理机构 |
|
代理人 |
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主权项 |
1. A probe system, comprising:
a measurement chamber that defines a measurement chamber internal volume; a chuck that is located within the measurement chamber internal volume; a measurement chamber temperature-control assembly that is configured to cool the chuck and a substrate within the measurement chamber internal volume to a temperature below a dew point temperature of an ambient environment surrounding the probe system; a measurement chamber purging assembly that is configured to direct a measurement chamber dry gas stream into the measurement chamber internal volume; an access chamber that defines an access chamber internal volume; a measurement chamber door that is configured to selectively isolate the measurement chamber internal volume from the access chamber internal volume; a transfer assembly that is configured to selectively transfer the substrate through the measurement chamber door and thus between the measurement chamber internal volume and the access chamber internal volume; and an access chamber purging assembly that is configured to selectively direct a heated access chamber dry gas stream in fluid contact with the substrate when the substrate is located within the access chamber internal volume. |
地址 |
Beaverton OR US |