| 发明名称 |
NOZZLE PLATE, LIQUID EJECTING HEAD, AND LIQUID EJECTING APPARATUS |
| 摘要 |
A silicon nozzle plate has excellent liquid resistance on an inner surface of a nozzle opening and a discharge surface. A plurality of the nozzle openings are disposed in a silicon substrate of the nozzle plate. A first tantalum oxide film is disposed by atomic layer deposition on both surfaces of the silicon substrate and the inner surface of the nozzle opening, and a second tantalum oxide film that is formed by plasma CVD is stacked on the first tantalum oxide film of the discharge surface. |
| 申请公布号 |
US2014184704(A1) |
申请公布日期 |
2014.07.03 |
| 申请号 |
US201314141065 |
申请日期 |
2013.12.26 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
MISAWA Midori;GOTO Tamotsu |
| 分类号 |
B41J2/14 |
主分类号 |
B41J2/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A nozzle plate comprising:
a silicon substrate; a plurality of nozzle openings which are disposed in the silicon substrate; a first tantalum oxide film which is formed by atomic layer deposition and disposed on both surfaces of the silicon substrate and an inner surface of the nozzle opening; and a second tantalum oxide film which is stacked by plasma CVD on the first tantalum oxide film of a discharge surface. |
| 地址 |
Tokyo JP |
