发明名称 METHOD OF PROCESSING A SEMICONDUCTOR STRUCTURE
摘要 <p>A method according to embodiments of the invention includes providing a wafer including a semiconductor structure grown on a growth substrate, the semiconductor structure comprising a III-nitride light emitting layer sandwiched between an n-type region and a p-type region. The wafer is bonded to a second substrate. The growth substrate is removed. After bonding the wafer to the second substrate, the wafer is processed into multiple light emitting devices.</p>
申请公布号 EP2748864(A1) 申请公布日期 2014.07.02
申请号 EP20120784063 申请日期 2012.08.21
申请人 KONINKLIJKE PHILIPS N.V. 发明人 BHAT, JÉRÔME, CHANDRA;STEIGERWALD, DANIEL, ALEXANDER;CAMRAS, MICHAEL, DAVID;CHOI, HAN, HO;GARDNER, NATHAN, FREDRICK;SHCHEKIN, OLEG, BORISOVICH
分类号 H01L33/00;H01L33/50 主分类号 H01L33/00
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