发明名称 ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
摘要 <p>An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.</p>
申请公布号 KR20140082654(A) 申请公布日期 2014.07.02
申请号 KR20147007153 申请日期 2012.09.05
申请人 GIGAPHOTON INC. 发明人 MORIYA MASATO;WAKABAYASHI OSAMU
分类号 H05G2/00;H01S3/223;H01S3/23 主分类号 H05G2/00
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