发明名称 GAS INJECTION UNIT AND A THIN-FILM VAPOUR-DEPOSITION DEVICE AND METHOD USING THE SAME
摘要 Provided are a gas injection unit and apparatus and method for depositing a thin layer using the same. The gas injection unit includes: an inner pipe through which a reaction gas is introduced; an outer pipe enclosing the inner pipe, through which a cooling fluid cooling the reaction gas in the inner pipe flows; and injection pipes injecting the reaction gas in the inner pipe to an outside of the outer pipe.
申请公布号 EP2560193(A4) 申请公布日期 2014.07.02
申请号 EP20100849896 申请日期 2010.09.06
申请人 SEMES CO., LTD. 发明人 PARK, HYEONG SOO
分类号 H01L21/205;C23C16/458 主分类号 H01L21/205
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