Disclosed is a method for forming a graphene pattern. The forming method thereof includes a step of forming a fine pattern defined by at least one trench on a substrate; a step of coating the fine pattern with a graphene solution; and a step of selectively forming a graphene layer on the fine pattern coming into contact with the graphene solution.
申请公布号
KR20140082439(A)
申请公布日期
2014.07.02
申请号
KR20120152407
申请日期
2012.12.24
申请人
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
发明人
CHUNG, KWANG HYO;KIM, JIN TAE;YU, YOUNG JUN;CHOI, JIN SIK;YOUN, DOO HYEB;KIM, KI CHUL;CHOI, CHOON GI