发明名称 SUBSTRATE TREATMENT SYSTEM
摘要 PURPOSE: A substrate processing system is provided to maximize space efficiency by successively supplying a substrate to each process chamber according to a process sequence with a stepping operation. CONSTITUTION: A plurality of openings(11) are formed in a sidewall of a main chamber(10). A plurality of process chambers(30) are formed in the outside of the opening of the main chamber. A transfer chamber(50) is formed in the main chamber. The transfer chamber supplies the substrate to the process chamber. A gate valve(G) is formed between the main chamber and the process chamber to open and close the opening.
申请公布号 KR101409808(B1) 申请公布日期 2014.07.02
申请号 KR20100099389 申请日期 2010.10.12
申请人 发明人
分类号 B65G49/06;H01L21/203;H01L21/677;H01L21/683 主分类号 B65G49/06
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