发明名称 MAGNETIC METAL SUBSTRATE AND INDUCTANCE ELEMENT
摘要 <p>The inductance device (4) includes: a magnetic metal substrate (2) comprising a metallic substrate (10) having first permeability, a first insulating layer (16a) disposed in the metallic substrate (10), and a first metallic wiring layer (22) having second permeability and disposed on the first insulating layer (16a); a first gap layer (24) disposed on the front side surface of the magnetic metal substrate (2); and a first magnetic flux generation layer (26) disposed on the first gap layer (24). There are provide a thin magnetic metal substrate adaptable to the large current use and advantageous in the high frequency characteristics; and an inductance device to which such a magnetic metal substrate are applied, wherein the inductance device is adaptable to smaller mounting area, larger inductance values, and large current use and advantageous in high frequency characteristics.</p>
申请公布号 EP2750148(A1) 申请公布日期 2014.07.02
申请号 EP20120828321 申请日期 2012.08.24
申请人 ROHM CO., LTD. 发明人 TSURUMI, NAOAKI;FUKAE, KEISUKE
分类号 H01F17/00;H01F5/00;H01F17/04;H05K1/05 主分类号 H01F17/00
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