发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF RESIN |
摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition includes: (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) as defined in the specification, wherein a polydispersity of the resin (P) is 1.20 or less. |
申请公布号 |
KR20140082675(A) |
申请公布日期 |
2014.07.02 |
申请号 |
KR20147008238 |
申请日期 |
2012.09.27 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KAWABATA TAKESHI;TSUBAKI HIDEAKI |
分类号 |
G03F7/039;C08F212/14;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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