发明名称 |
TRENCH PROCESS AND STRUCTURE FOR BACKSIDE CONTACT SOLAR CELLS WITH POLYSILICON DOPED REGIONS |
摘要 |
A solar cell includes polysilicon P-type and N-type doped regions on a backside (106) of a substrate (103), such as a silicon wafer. A trench structure (104) separates the P-type doped region (101) from the N-type doped region (102). Each of the P-type and N-type doped regions may be formed over a thin dielectric layer (113). The trench structure (104) may include a textured surface (114) for increased solar radiation collection. Among other advantages, the resulting structure increases efficiency by providing isolation between adjacent P-type and N-type doped regions, thereby preventing recombination in a space charge region where the doped regions would have touched. |
申请公布号 |
EP2297789(A4) |
申请公布日期 |
2014.07.02 |
申请号 |
EP20090763100 |
申请日期 |
2009.04.29 |
申请人 |
SUNPOWER CORPORATION |
发明人 |
DE CEUSTER, DENIS;COUSINS, PETER, JOHN;SMITH, DAVID, D |
分类号 |
H01L31/0745;H01L31/072;H01L31/18 |
主分类号 |
H01L31/0745 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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