发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF
摘要 The present invention relates to a photosensitive resin composition for a resin black matrix. More specifically, the present invention can provide a black matrix which optimizes contents of pigments, a photopolymerization initiator, and zirconium silicate included in the photosensitive resin composition; has high resolution and surface resistivity by using pigments with high resistivity; and has high reliability by enhancing adhesion under a high temperature and humidity condition.
申请公布号 KR20140082237(A) 申请公布日期 2014.07.02
申请号 KR20120151886 申请日期 2012.12.24
申请人 KOLON INDUSTRIES, INC. 发明人 HAN, JI HYE;HAN, JAE GOOK;YOON, KYUNG KEUN
分类号 G03F7/028;G02B5/20;G03F7/11 主分类号 G03F7/028
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