发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF |
摘要 |
The present invention relates to a photosensitive resin composition for a resin black matrix. More specifically, the present invention can provide a black matrix which optimizes contents of pigments, a photopolymerization initiator, and zirconium silicate included in the photosensitive resin composition; has high resolution and surface resistivity by using pigments with high resistivity; and has high reliability by enhancing adhesion under a high temperature and humidity condition. |
申请公布号 |
KR20140082237(A) |
申请公布日期 |
2014.07.02 |
申请号 |
KR20120151886 |
申请日期 |
2012.12.24 |
申请人 |
KOLON INDUSTRIES, INC. |
发明人 |
HAN, JI HYE;HAN, JAE GOOK;YOON, KYUNG KEUN |
分类号 |
G03F7/028;G02B5/20;G03F7/11 |
主分类号 |
G03F7/028 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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