| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for producing a gas barrier film excelling in a gas barrier property and bending resistance, usable of a flexible resin film, and high in an industrial value because of suppressing process pollution; and an organic electronic element such as an organic photoelectric conversion element and an organic EL element using the same. <P>SOLUTION: In this gas barrier film, a polysilazane coating layer is formed at least on one surface of a base material, and modified by excimer lamp irradiation to be converted into a barrier layer. In the gas barrier film, an element ratio measured in the depth direction of XPS of the barrier layer satisfies the following expressions (1-1), (2-1) and (3-1). Expression (1-1): 1.0<O/Si≤2.3 at 5% of the front surface side in the depth direction of the barrier layer. Expression (2-1): 0.2<O/Si≤2.0 at 95% of the base material side in the depth direction of the barrier layer. Expression (3-1): 0≤N/Si≤0.8 in the whole area in the depth direction of the barrier layer. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
