发明名称 Semiconductor device and method for manufacturing the same
摘要 A semiconductor device includes a semiconductor substrate having an active region and an isolation region. A gate structure is provided on the semiconductor device. First and second impurity regions are provided in the substrate on both sides of the gate structure. A pad electrode is provided to contact the first impurity region. Because the pad electrode is provided on the first impurity region of the semiconductor device, the contact plug does not directly contact the active region. Accordingly, failures caused by damage to the active region may be prevented.
申请公布号 KR101414076(B1) 申请公布日期 2014.07.02
申请号 KR20080089052 申请日期 2008.09.10
申请人 发明人
分类号 H01L21/336;H01L21/8242;H01L27/108 主分类号 H01L21/336
代理机构 代理人
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