发明名称 METHOD FOR MANUFACTURING CIGS PHOTORECEPTIVE LAYER USING LASER
摘要 <p>Provided is a method for manufacturing a CIGS light absorption layer using laser which includes: a step of forming a copper-indium-gallium-selenium (CIGS) or copper-indium-gallium (CIG) seed layer on a substrate; a step of crystallizing the seed layer by emitting the laser; and a step of forming a CIGS or CIG light adsorption layer by growing the crystallized seed layer. The thickness of the seed layer is 300 nm or less (except 0 nm). According to the present invention, the crystallinity of the light absorption layer is excellent. Process speed is improved. The deformation of a substrate is not generated.</p>
申请公布号 KR20140082103(A) 申请公布日期 2014.07.02
申请号 KR20120151504 申请日期 2012.12.21
申请人 POSCO 发明人 KIM, KYOUNG BO;PARK, YOUNG JUN;YUN, HYUN CHU;BAEK, JE HOON;KIM, MOO JIN;KIM, JONG SANG;LEE, JAE RYUNG
分类号 H01L31/0749;H01L31/042;H01L31/18 主分类号 H01L31/0749
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