Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure

摘要

A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.

主权项

1. A device manufacturing method comprising:
projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table during the projecting; and detecting residual liquid on the substrate and/or the substrate table by emitting detection light onto the substrate and/or the substrate table while the substrate is held by the substrate table after the substrate has been exposed by the patterned beam of radiation, wherein the detection of the residual liquid is performed while the substrate table is moved so that the detection light and the substrate held by the substrate table are relatively moved.