发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT BLOCKING LAYER USING THE SAME
摘要 Provided are a photosensitive resin composition comprising (A) a binder resin containing a cardo-based resin which includes a repeating unit indicated by chemical formula 1, (B) a photopolymerization monomer, (C) a photopolymerization initiator, (D) a coloring agent, and (E) a solvent; and a light-shielding layer using the same. In chemical formula 1, each substituent is the same as defined in the specification.
申请公布号 KR20140081463(A) 申请公布日期 2014.07.01
申请号 KR20120151246 申请日期 2012.12.21
申请人 CHEIL INDUSTRIES INC. 发明人 AHN, KYUNG WON;LEE, CHANG MIN;KIM, JI HYE;YU, A RUM;CHOI, HYUN MOO
分类号 G03F7/032;G03F7/028;G03F7/11 主分类号 G03F7/032
代理机构 代理人
主权项
地址