发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT BLOCKING LAYER USING THE SAME |
摘要 |
Provided are a photosensitive resin composition comprising (A) a binder resin containing a cardo-based resin which includes a repeating unit indicated by chemical formula 1, (B) a photopolymerization monomer, (C) a photopolymerization initiator, (D) a coloring agent, and (E) a solvent; and a light-shielding layer using the same. In chemical formula 1, each substituent is the same as defined in the specification. |
申请公布号 |
KR20140081463(A) |
申请公布日期 |
2014.07.01 |
申请号 |
KR20120151246 |
申请日期 |
2012.12.21 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
AHN, KYUNG WON;LEE, CHANG MIN;KIM, JI HYE;YU, A RUM;CHOI, HYUN MOO |
分类号 |
G03F7/032;G03F7/028;G03F7/11 |
主分类号 |
G03F7/032 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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