| 摘要 |
<p>The present invention discloses a deposition apparatus. According to an aspect of the present invention, the deposition apparatus includes a nozzle part which provides vaporized particles to be deposited on a substrate; a sealing member which is formed in the shape of a ring on an inlet of the nozzle part; a crucible which is arranged under the nozzle part, contains a material to be vaporized, and discharges the vaporized particles as the material to be vaporized is heated and vaporized; and a lifting unit. The lifting unit lifts up the crucible so that the crucible can be attached tightly on the sealing member and can communicate with the nozzle part. The lifting unit brings the crucible down so that the crucible can be detached from the sealing member.</p> |
