发明名称 |
Semiconductor memory device and method for inspecting the same |
摘要 |
When the threshold voltage Vth of the transistor in the memory cell is within the allowable range is determined, a memory cell which does not have sufficient data retention characteristics is eliminated. In order to eliminate such a memory cell, the potential of a gate of the transistor is kept at an appropriate potential VGM and the potential of a drain of the transistor is set higher than or equal to VGM. When data is written to the memory cell in this state, the potential of a source of the transistor is expressed as a formula including the threshold voltage Vth, (VGM−Vth). By comparison between the level of the potential and the level of a reference potential, whether the threshold voltage Vth is within the allowable range can be determined. |
申请公布号 |
US8767443(B2) |
申请公布日期 |
2014.07.01 |
申请号 |
US201113235967 |
申请日期 |
2011.09.19 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
Saito Toshihiko |
分类号 |
G11C11/24 |
主分类号 |
G11C11/24 |
代理机构 |
Fish & Richardson P.C. |
代理人 |
Fish & Richardson P.C. |
主权项 |
1. A method for inspecting a semiconductor memory device comprising a memory cell including a capacitor and a transistor, one of a source and a drain of the transistor being connected to the capacitor, and the transistor including an oxide semiconductor, the method comprising the steps of:
a first step of turning on the transistor to accumulate electrical charge in the capacitor; a second step of turning off the transistor and setting the other of the source and the drain of the transistor to a floating state after the first step; and a third step of applying a voltage to a gate of the transistor and measuring a potential of the other of the source and the drain of the transistor to inspect a threshold voltage of the transistor after the second step. |
地址 |
Atsugi-shi, Kanagawa-ken JP |