| 发明名称 | Resist composition, method of forming resist pattern, novel compound, and acid generator | ||
| 摘要 | A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below (wherein Z+ represents an organic cation).; | ||
| 申请公布号 | US8765352(B2) | 申请公布日期 | 2014.07.01 |
| 申请号 | US201113223595 | 申请日期 | 2011.09.01 |
| 申请人 | Tokyo Ohka Kogyo Co., Ltd. | 发明人 | Utsumi Yoshiyuki;Seshimo Takehiro |
| 分类号 | G03F7/004;G03F7/029;G03F7/039;C07C381/12;C07C309/06;C07C309/07 | 主分类号 | G03F7/004 |
| 代理机构 | Knobbe, Martens, Olson & Bear, LLP | 代理人 | Knobbe, Martens, Olson & Bear, LLP |
| 主权项 | 1. A resist composition, comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) comprises an acid generator (B1) containing a compound represented by general formula (b1-1) shown below:wherein Z+ represents an organic cation. | ||
| 地址 | Kawasaki-shi JP | ||