发明名称 |
Resin and photoresist composition comprising same |
摘要 |
The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I):;
wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1):
A10-X10sA11- (a-g1)
wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and
a photoresist composition comprising the resin and an acid generator. |
申请公布号 |
US8765357(B2) |
申请公布日期 |
2014.07.01 |
申请号 |
US201213447796 |
申请日期 |
2012.04.16 |
申请人 |
Sumitomo Chemical Company, Limited |
发明人 |
Masuyama Tatsuro;Ichikawa Koji |
分类号 |
G03F7/038;G03F7/039;G03F7/30;C08F236/20 |
主分类号 |
G03F7/038 |
代理机构 |
Birch, Stewart, Kolasch & Birch, LLP |
代理人 |
Birch, Stewart, Kolasch & Birch, LLP |
主权项 |
1. A resin comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A1 represents a group represented by the formula (a-g1):
A10-X10sA11- (a-g1) wherein A10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A11 represents a C1-C5 aliphatic hydrocarbon group, X10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2; and a structural unit derived from a monomer having no acid-labile group and having one or more fluorine atoms. |
地址 |
Tokyo JP |