Microlithographic projection exposure apparatus

摘要

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

主权项

1. A projection exposure apparatus, comprising:
a mirror array, comprising:
a base body; anda plurality of mirror units, each mirror unit comprising:
a mirror;a control device configured to modify a position of the mirror relative to the base body; andthermal conduction elements, the thermal conduction elements being connected to the mirror, the thermal conduction elements not contributing to the bearing of the mirror, and the thermal conduction elements extending in a direction of the base body so that heat can be transferred from the thermal conduction elements to the base body, wherein the projection exposure apparatus is a microlithographic projection exposure apparatus.