发明名称 Semiconductor device with variable resistance element and method for manufacturing the same
摘要 A semiconductor device includes at least first and second electrodes, and a layer including a transition metal oxide layer sandwiched between the first and second electrodes. The transition metal oxide layer includes first and second transition metal oxide layers formed of different first and second transition metals, respectively. The first transition metal oxide layer is provided on the first electrode side, the second transition metal oxide layer is provided on the second electrode side, the first transition metal oxide layer and the second transition metal oxide layer are in contact with each other, the first transition metal oxide layer has an oxygen concentration gradient from the interface between the first transition metal oxide layer and the second transition metal oxide layer toward the first electrode side, and the oxygen concentration at the interface is greater than the oxygen concentration on the first electrode side.
申请公布号 US8766233(B2) 申请公布日期 2014.07.01
申请号 US201013499956 申请日期 2010.10.04
申请人 NEC Corporation 发明人 Sakotsubo Yukihiro;Terai Masayuki;Tada Munehiro;Yabe Yuko;Saito Yukishige
分类号 H01L47/00 主分类号 H01L47/00
代理机构 Young & Thompson 代理人 Young & Thompson
主权项 1. A semiconductor device, comprising at least a first electrode, a second electrode, and a transition metal oxide layer sandwiched between the first electrode and the second electrode, wherein the transition metal oxide layer includes a first transition metal oxide layer formed of a first transition metal and a second transition metal oxide layer formed of a second transition metal different from the first transition metal, the first transition metal oxide layer is provided on a first electrode side, the second transition metal oxide layer is provided on a second electrode side, the first transition metal oxide layer and the second transition metal oxide layer are in contact with each other, the first transition metal oxide layer has an oxygen concentration gradient from an interface between the first transition metal oxide layer and the second transition metal oxide layer toward the first electrode side, the oxygen concentration at the interface is greater than the oxygen concentration on the first electrode side, and a composition of the first transition metal oxide at the interface between the first transition metal oxide layer and the second transition metal oxide layer is a stoichiometric composition.
地址 Tokyo JP