发明名称 |
Nanoscale electronic device with barrier layers |
摘要 |
On example of the present invention is a nanoscale electronic device comprising a first conductive electrode, a second conductive electrode, and a device layer. The device layer comprises a first dielectric material, between the first and second conductive electrodes, that includes an effective device layer, a first barrier layer near a first interface between the first conductive electrode and the device layer, and a second barrier layer near a second interface between the second conductive electrode and the device layer. A second example of the present invention is an integrated circuit that incorporates nanoscale electronic devices of the first example. |
申请公布号 |
US8766231(B2) |
申请公布日期 |
2014.07.01 |
申请号 |
US201113041617 |
申请日期 |
2011.03.07 |
申请人 |
Hewlett-Packard Development Company, L.P. |
发明人 |
Yi Wei;Yang Jianhua;Ribeiro Gilberto Medeiros |
分类号 |
H01L45/00;H01L21/62 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
1. A nanoscale electronic device comprising:
a first conductive electrode; a second conductive electrode; and a device layer, comprising a first dielectric material, between the first and second conductive electrodes that includes:
an effective device layer between a first barrier layer and a second barrier layer,the first barrier layer near a first interface between the first conductive electrode and the device layer, andthe second barrier layer near a second interface between the second conductive electrode and the device layerwhere each of the first barrier layer and said second barrier layer further comprise a large-band-gap-material layer embedded within a dielectric material, the large-band-gap-material having a band gap that is greater than a band gap of the effective device layer. |
地址 |
Houston TX US |