DRY FILM PHOTORESIST HAVING OXYGEN PERMEABLE BARRIER LAYER AND MANUFACTURING METHOD THEREOF

摘要

Provided is a dry film photoresist comprising: a supporter film having an oxygen permeable barrier layer on the upper part; a photosensitive resin layer formed on the oxygen permeable barrier layer; and a protection film formed on the photosensitive resin layer. According to the present invention, the oxygen permeable barrier layer is formed on the film of the supporter in order to prevent decrease in curing reaction due to oxygen penetration of the dry film photoresist, through which faulty process in production procedures can be minimized by reducing non-exfoliated residue.