| 摘要 |
The present invention relates to a method for forming a layer by using a layer forming apparatus having a rotating table capable of loading a plurality of substrates thereon, a first gas supply unit, and a second gas supply unit. The method includes: a first process of rotating the rotating table by supplying an oxide gas from the first and second gas supply units; a second process of supplying a reaction gas including a predetermined element from the first gas supply units, rotating the rotating table by supplying the oxide gas from the second gas supply unit, and forming an oxide layer including the predetermined element on the substrate; and a third process of rotating the rotating table by supplying the oxide gas from the first and second gas supply units. |
