| 摘要 |
The present invention relates to a device and a method for controlling surface wetting properties of materials and a lab-on-a-chip using the same. The lab-on-a-chip includes a substrate, a channel which is formed on the substrate and forms a movement path for a sample, and a reactive gas supply unit which supplies reactive gas to the channel. The channel is includes a rough surface material which is formed on the substrate and has roughness larger than the substrate and a reactive material which is formed on the rough surface material and changes its volume by reacting with reactive gas. |
