发明名称 | Manufacturing method of light emitting device | ||
摘要 | A manufacturing method of a light emitting device is provided. A first electrode is formed on a substrate. The first electrode includes a patterned conductive layer, and the patterned conductive layer includes an alloy containing a first metal and a second metal. An annealing process is performed on the first electrode, so as to form a passivation layer at least on a side surface of the first electrode. The passivation layer includes a compound of the second metal. A light emitting layer is formed on the first electrode. A second electrode is formed on the light emitting layer. | ||
申请公布号 | US8765506(B2) | 申请公布日期 | 2014.07.01 |
申请号 | US201313947123 | 申请日期 | 2013.07.22 |
申请人 | Au Optronics Corporation | 发明人 | Yang Chao-Shun;Hu Chen-Ming |
分类号 | H01L31/0328;H01L31/0336;H01L31/072;H01L31/109 | 主分类号 | H01L31/0328 |
代理机构 | Jianq Chyun IP Office | 代理人 | Jianq Chyun IP Office |
主权项 | 1. A manufacturing method of a light emitting device, comprising: forming a first electrode on a substrate, the first electrode comprising a first patterned conductive layer, the first patterned conductive layer comprising an alloy containing a first metal and indium, an alloy containing the first metal and zinc, or an alloy containing the first metal and indium-zinc, wherein indium, zinc, or indium-zinc accounts for about 0.1 wt %˜about 2 wt % of the alloy; performing an annealing process on the first electrode to form a passivation layer at least on a side surface of the first electrode, wherein the passivation layer comprises a compound of indium oxide, zinc oxide, or indium-zinc oxide; forming a light emitting layer on the first electrode; and forming a second electrode on the light emitting layer. | ||
地址 | Hsinchu TW |