发明名称 Power MOSFET package
摘要 A power MOSFET package includes a semiconductor substrate having opposite first and second surfaces, having a first conductivity type, and forming a drain region, a doped region extending downward from the first surface and having a second conductivity type, a source region in the doped region and having the first conductivity type, a gate overlying or buried under the first surface, wherein a gate dielectric layer is between the gate and the semiconductor substrate, a first conducting structure overlying the semiconductor substrate, having a first terminal, and electrically connecting the drain region, a second conducting structure overlying the semiconductor substrate, having a second terminal, and electrically connecting the source region, a third conducting structure overlying the semiconductor substrate, having a third terminal, and electrically connecting the gate, wherein the first, the second, and the third terminals are substantially coplanar, and a protection layer between the semiconductor substrate and the terminals.
申请公布号 US8766431(B2) 申请公布日期 2014.07.01
申请号 US201313828537 申请日期 2013.03.14
申请人 发明人 Perng Baw-Ching;Wen Ying-Nan;Chang Shu-Ming;Ni Ching-Yu;Hsieh Yun-Ji;Chen Wei-Ming;Tsai Chia-Lun;Cheng Chia-Ming
分类号 H01L23/04 主分类号 H01L23/04
代理机构 Liu & Liu 代理人 Liu & Liu
主权项 1. A power MOSFET package, comprising: a semiconductor substrate having a first surface and an opposite second surface, wherein the semiconductor substrate has a first conductivity type and forms a drain region; a doped region extending downward from the first surface, the doped region having a second conductivity type; a source region located in the doped region, the source region having the first conductivity type; a gate formed overlying the first surface or buried under the first surface, wherein a gate dielectric layer is located between the gate and the semiconductor substrate; a first conducting structure located overlying the semiconductor substrate and having a first terminal, the first conducting structure electrically connected to the drain region; a second conducting structure located overlying the semiconductor substrate and having a second terminal, the second conducting structure electrically connected to the source region; a third conducting structure located overlying the semiconductor substrate and having a third terminal, the third conducting structure electrically connected to the gate, wherein the first terminal, the second terminal, and the third terminal are substantially coplanar; and a protection layer located between the semiconductor substrate and the first terminal, the second terminal, and the third terminal.
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