发明名称 Non-volatile multi-bit memory with programmable capacitance
摘要 Non-volatile multi-bit memory with programmable capacitance is disclosed. Illustrative data memory units include a substrate including a source region and a drain region; and a gate stack structure over the substrate and between the source region and drain region. The gate stack structure includes a first solid electrolyte cell and a second solid electrolyte cell. The solid electrolyte cells having a capacitance that is controllable between at least two states. A gate contact layer is electrically coupled to a voltage source. The first solid electrolyte cell and the second solid electrolyte cell separate the gate contact layer from the substrate.
申请公布号 US8766230(B2) 申请公布日期 2014.07.01
申请号 US201012857717 申请日期 2010.08.17
申请人 Seagate Technology LLC 发明人 Wang Xuguang;Huang Shuiyuan;Dimitrov Dimitar V.;Tang Michael Xuefei;Xue Song S.
分类号 H01L45/00 主分类号 H01L45/00
代理机构 Mueting, Raasch & Gebhardt, P.A. 代理人 Mueting, Raasch & Gebhardt, P.A.
主权项 1. A multi-bit memory unit, comprising: a substrate including a source region and a drain region; and a gate stack structure over the substrate and between the source region and drain region, the gate stack structure comprising: an insulating layer over the substrate;a first solid electrolyte cell over the insulating layer, the first solid electrolyte cell having a capacitance that is controllable between at least two states and proximate the source region;a second solid electrolyte cell over the insulating layer, the second solid electrolyte cell having a capacitance that is controllable between at least two states and proximate the drain region;an insulating element separates the first solid electrolyte cell from the second solid electrolyte cell;a first anode electrically coupled to the first solid electrolyte cell;a second anode electrically coupled to the second solid electrolyte cell; anda gate contact layer electrically coupled to a voltage source, wherein the first solid electrolyte cell is disposed between the gate contact layer and the insulating layer and the second solid electrolyte cell is disposed between the gate contact layer and the insulating layer.
地址 Cupertino CA US