| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve measurement accuracy of a wavefront shape in an aberration measurement device such as a Shack Hartman sensor and the like.SOLUTION: The aberration measurement device measuring aberration of return light from an inspected object irradiated with measurement light includes: division means that divides the return light into a plurality of pieces of light; detection means that detects a position of an area irradiated with each of the plurality of pieces of light and a size thereof; and acquisition means that acquires respective shapes of wavefronts of the plurality of pieces of light on the basis of the detected size. On the basis of the acquired shape in each of the plurality of pieces of light and the detected position, the aberration is measured.</p> |
