发明名称 COATING LIQUID FOR METAL OXIDE FILM FORMATION, METAL OXIDE FILM, FIELD EFFECT TRANSISTOR, AND PROCESS OF MANUFACTURING FIELD EFFECT TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a coating liquid for metal oxide film formation, capable of easily manufacturing a metal oxide film having a desired volume resistivity in a large area, having high accuracy in forming the metal oxide film of a desired shape.SOLUTION: The coating liquid for metal oxide film formation contains an inorganic indium compound, a barium compound, and an organic solvent.
申请公布号 JP2014120712(A) 申请公布日期 2014.06.30
申请号 JP20120276801 申请日期 2012.12.19
申请人 RICOH CO LTD 发明人 NAKAMURA YUKI;UEDA NAOYUKI;TAKADA MIKIKO;ABE YUKIKO;MATSUMOTO SHINJI;SONE YUJI;SAOTOME RYOICHI;NIIE SADANORI
分类号 H01L29/786;H01L21/336;H01L21/368 主分类号 H01L29/786
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