发明名称 |
COATING LIQUID FOR METAL OXIDE FILM FORMATION, METAL OXIDE FILM, FIELD EFFECT TRANSISTOR, AND PROCESS OF MANUFACTURING FIELD EFFECT TRANSISTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a coating liquid for metal oxide film formation, capable of easily manufacturing a metal oxide film having a desired volume resistivity in a large area, having high accuracy in forming the metal oxide film of a desired shape.SOLUTION: The coating liquid for metal oxide film formation contains an inorganic indium compound, a barium compound, and an organic solvent. |
申请公布号 |
JP2014120712(A) |
申请公布日期 |
2014.06.30 |
申请号 |
JP20120276801 |
申请日期 |
2012.12.19 |
申请人 |
RICOH CO LTD |
发明人 |
NAKAMURA YUKI;UEDA NAOYUKI;TAKADA MIKIKO;ABE YUKIKO;MATSUMOTO SHINJI;SONE YUJI;SAOTOME RYOICHI;NIIE SADANORI |
分类号 |
H01L29/786;H01L21/336;H01L21/368 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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