| 摘要 |
PROBLEM TO BE SOLVED: To provide an electronic exposure device in which the time required for movement control of a stage can be reduced significantly, while enhancing the throughput significantly.SOLUTION: An electronic exposure device 1 includes a surface pattern electron generation part 2 for generating electrons in a planar pattern, a surface pattern control unit 3 for controlling the pattern of electrons generated from the surface pattern electron generation part 2, a stage 7 on which an exposed member is mounted, a stage movement control unit 8 for controlling movement of the stage 7, and a mapping projection unit 9 for projection mapping the electrons generated from the surface pattern electron generation part 2 to the imaging position on the exposed surface of an exposed member S. When performing electronic exposure to the exposed surface while moving the stage 7 continuously, the surface pattern control unit 3 changes the pattern of electrons generated from the surface pattern electron generation part 2 synchronously with the movement of the stage 7. |
