| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for forming an overlay film, from which a pattern excellent in roughness and a pattern profile can be formed in a pattern forming process by extreme ultraviolet exposure, and to provide a method for forming a pattern using the above composition.SOLUTION: The composition for forming an overlay film comprises a fullerene derivative having a hydrophilic group, and a solvent. The method for forming a pattern comprises applying the above composition on a resist surface, and exposing and developing the composition. The composition may further include a polymer. |
