发明名称 EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD OF MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an exposure device in which the aberration having 2-fold symmetry can be controlled in an arbitrary direction, by driving one member.SOLUTION: An exposure device includes an optical element arranged in the optical axis of a projection optical system 110 and having a surface of rotationally asymmetric shape, a drive unit 22 for driving the optical element with at least two degree of freedom, and a control unit 123 for controlling the driving of the two degree of freedom so as to correct the aberration of a directional component represented by the linear sum of aberration of the two directional components, based on the information indicating the relationship of the drive amount of the two degree of freedom and two directional components of aberration having 2-fold symmetry, and the amounts to be adjusted of the two directional components of aberration.
申请公布号 JP2014120682(A) 申请公布日期 2014.06.30
申请号 JP20120276121 申请日期 2012.12.18
申请人 CANON INC 发明人 TAKAHASHI RIKA;SUMIYOSHI YUHEI
分类号 H01L21/027;G01B11/24;G03F7/20 主分类号 H01L21/027
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