| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint device capable of reducing defects in a pattern formed on a substrate.SOLUTION: An imprint device for patterning a resin on a substrate by using a mold includes a supply section supplying the energy for curing the resin in contact with the mold, and an adjustment section for adjusting the energy supplied to the resin from the supply section, so that the energy supplied to a region where the mold is released from the resin at the end is more than the energy supplied to a region where the mold is released from the resin at first. |
