发明名称 |
QUANTITATIVE ANALYSIS METHOD FOR MEASUREMENT TARGET ELEMENT IN SPECIMEN USING LASER-INDUCED PLASMA SPECTRUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method which is capable of calculating the intensity of a laser-induced plasma spectrum even when peaks of the spectrum very closely overlap each other in laser-induced plasma spectroscopy, and is capable of searching for a peak having excellent precision and reproducibility when an analysis target element has a high concentration.SOLUTION: A quantitative analysis method for a measurement target element in a specimen using laser-induced plasma spectrum includes: irradiating a specimen containing a measurement target element with a laser beam to generate plasma; obtaining an optical spectrum generated from the plasma; obtaining a fitting curve in an area where at least one measurement target peak is excluded, in the optical spectrum; separating and obtaining a measurement target peak curve including at least one measurement target peak, by excluding the fitting curve in the optical spectrum; calculating peak intensities at specific wavelengths selected on the fitting curve and the measurement target peak curve; and obtaining a composition ratio of the measurement target element on the basis of a ratio of peak intensities at the specific wavelengths selected on each curve. |
申请公布号 |
JP2014119457(A) |
申请公布日期 |
2014.06.30 |
申请号 |
JP20130258001 |
申请日期 |
2013.12.13 |
申请人 |
GWANGJU INST OF SCIENCE &, TECHNOLOGY |
发明人 |
JEONG SUNG HO;IN JEONG HWAN;LEE SEOKHEE;KIM CHAN KYU |
分类号 |
G01N21/63 |
主分类号 |
G01N21/63 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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