DRAWING DEVICE AND METHOD OF MANUFACTURING ARTICLE

摘要

PROBLEM TO BE SOLVED: To provide a drawing device which is advantageous in the aspect of overlay accuracy and throughput.SOLUTION: A drawing device 200 includes a plurality of drawing units 206 (206a to 206j) for drawing a pattern on a substrate with a plurality of charged particle beams, and the plurality of drawing parts 206 perform processing in parallel with each other. The drawing device 200 has a measurement unit 205 which measures flatness of the substrate. Moreover, each of the plurality of drawing units 206 includes: a charged particle optical system for emitting the plurality of charged particle beams to the substrate; and a control unit for controlling operation of the charged particle optical system so as to compensate for distortion of the pattern determined by data of inclination of each of the charged particle beams with respect to the axis of the charged particle optical system and data on flatness measured by the measurement unit.