发明名称 STRUCTURE FOR FINFETS
摘要 An SRAM array is formed by FinFETs formed by a fin line. Each fin line is formed in a substrate. The bottom part of the fin line is surrounded by an isolation region. The upper part of the fin line protrudes from the top surface of the isolation region. In the drawing of the first cross-section of the SRAM array, each fin line is a rectangle. In the drawing of the second cross-section of the SRAM array, the terminal of each fin line is a taper shape.
申请公布号 KR20140080475(A) 申请公布日期 2014.06.30
申请号 KR20140070263 申请日期 2014.06.10
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIAW JHON JHY
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址