SUBSTRATE TREATING APPARATUS

摘要

The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to the present invention includes a tray on which a substrate is mounted and which moves to the inside of a chamber to carry out a predetermined process for the substrate; and a position determining unit for determining the position of the tray to be in its regular position in the chamber. The position determining unit determines the position of the tray based on the central part of the tray to make the central part of the tray positioned in its regular position in the chamber.