发明名称 ELECTROMAGNETIC LENS AND ELECTRON BEAM EXPOSURE DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an electromagnetic lens and an electron beam exposure device, capable of generating a desired magnetic field without an increased heating value if an external diameter is reduced.SOLUTION: In an electromagnetic lens, having an electromagnetic coil 3 wound in rotational symmetry relative to the optical axis of an electron beam and a pole piece 2 covering the electromagnetic coil 3, a gap 2a is integrally formed at one or the boundary part of both an inner peripheral wall 2b, formed at the inner peripheral side of the pole piece 2, and a lower end wall 2d formed on the end part of the electron beam on the output side. The inner peripheral wall 2b is formed thinnest at a part near the gap 2a, with a gradually larger thickness as becoming apart from the gap 2a. Further, according to a varied thickness of the inner peripheral wall 2b, the width of the electromagnetic lens 3 in the radial direction is formed larger as becoming nearer the gap 2a.</p>
申请公布号 JP2014120545(A) 申请公布日期 2014.06.30
申请号 JP20120273068 申请日期 2012.12.14
申请人 ADVANTEST CORP 发明人 YAMADA AKIO
分类号 H01L21/027;G03F7/20;H01J37/141;H01J37/305 主分类号 H01L21/027
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