发明名称 RESISTIVE RANDOM ACCESS MEMORY(RRAM) STRUCTURE AND METHOD OF MAKING THE RRAM STRUCTURE
摘要 <p>The present disclosure provides a resistive random access memory (RRAM) cell. The RRAM cell includes a transistor; a bottom electrode adjacent to a drain region of the transistor and coplanar with a gate; a resistive material layer on the bottom electrode; a top electrode on the resistive material layer; and a conductive material connecting the bottom electrode to the drain region.</p>
申请公布号 KR20140080401(A) 申请公布日期 2014.06.30
申请号 KR20130061662 申请日期 2013.05.30
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHANG CHIH YANG;CHU WEN TING;TU KUO CHI;LIAO YU WEN;CHEN HSIA WEI;YANG CHIN CHIEH
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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