发明名称 |
RESISTIVE RANDOM ACCESS MEMORY(RRAM) STRUCTURE AND METHOD OF MAKING THE RRAM STRUCTURE |
摘要 |
<p>The present disclosure provides a resistive random access memory (RRAM) cell. The RRAM cell includes a transistor; a bottom electrode adjacent to a drain region of the transistor and coplanar with a gate; a resistive material layer on the bottom electrode; a top electrode on the resistive material layer; and a conductive material connecting the bottom electrode to the drain region.</p> |
申请公布号 |
KR20140080401(A) |
申请公布日期 |
2014.06.30 |
申请号 |
KR20130061662 |
申请日期 |
2013.05.30 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHANG CHIH YANG;CHU WEN TING;TU KUO CHI;LIAO YU WEN;CHEN HSIA WEI;YANG CHIN CHIEH |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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