发明名称 GAS INJECTOR APPARATUS FOR PLASMA APPLICATOR
摘要 <p>A plasma chamber for use with a reactive gas source that includes a first conduit comprising a wall, an inlet, an outlet, an inner and outer surface, and a plurality of openings through the wall, the inlet receives a first gas for generating a reactive gas in the first conduit with a plasma formed in the first conduit. The plasma chamber also includes a second conduit that includes a wall, an inlet, and an inner surface. The first conduit is disposed in the second conduit defining a channel between the outer surface of the first conduit and the inner surface of the second conduit. A second gas provided to the inlet of the second conduit flows along the channel and through the plurality of openings of the wall of the first conduit into the first conduit to surround the reactive gas and plasma in the first conduit.</p>
申请公布号 SG11201402773X(A) 申请公布日期 2014.06.27
申请号 SGX11201402773 申请日期 2012.12.04
申请人 MKS INSTRUMENTS, INC. 发明人 CHEN, XING;GU, YOUFAN;JI, CHENGXIANG;LOOMIS, PAUL A.;POKIDOV, ILYA;WENZEL, KEVIN W.
分类号 H01J37/32;C23C16/455 主分类号 H01J37/32
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