| 摘要 |
The present invention relates to a chemical liquid supply device. The present invention includes a pressurizing tank which stores a chemical liquid, a chemical supply line which supplies a chemical to the pressurizing tank, a vent line which exhausts the inner part of the pressurizing tank and adjusts the inner pressure of the pressurizing tank, a push gas supply line which supplies a push gas to the pressurizing tank and adjusts the inner pressure of the pressurizing tank, a supply line which supplies the chemical liquid in the pressurizing tank to a process device, and a pressure sensor which is installed in the push gas supply line and detects the inner pressure of the pressurizing tank. The pressure sensor for detecting the pressure of the pressurizing tank which stores the chemical liquid is installed on the push gas supply line. A check valve is located between the pressurizing tank and it, thereby, preventing the fume of the chemical solution of the pressurizing tank from affecting the pressure sensor. Therefore, the present invention prevents the lifetime of the pressure sensor from being shorten and the malfunction of the pressure sensor. |
