发明名称 Valve device of an application device for applying fluid to a substrate, and applicator
摘要 Application device comprises a cleaning valve arrangement (20) assigned to the fluid inlet channel (110) of a distribution fluid chamber with a cleaning valve nozzle (30) and a valve actuating unit (5) for closing and opening the cleaning valve nozzle. A flow path (100) for cleaning the fluid chamber is formed in the distribution fluid chamber between the fluid inlet channel and the cleaning valve arrangement when the cleaning valve nozzle is open. Independent claims are also included for the following: (1) Method for cleaning the application device; and (2) Electronic control device for the application device. Preferred Features:
申请公布号 KR101398760(B1) 申请公布日期 2014.06.27
申请号 KR20107000762 申请日期 2008.05.20
申请人 发明人
分类号 B05B1/20;B05B15/02;B05C5/02 主分类号 B05B1/20
代理机构 代理人
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