| 摘要 |
PROBLEM TO BE SOLVED: To provide a simple method of evaluating the performance of a copolymer for lithography in pattern formation without carrying out pattern formation.SOLUTION: A method of evaluating a copolymer for lithography includes (1) a step of forming a thin film on a substrate by using a composition containing a copolymer for lithography and a compound generating an acid when irradiated with active rays or radiation rays and irradiating the resultant body with active rays or radiation rays, (2) a step of carrying out an acid elimination reaction by the irradiation step of the step (1), (3) a step of determining an amount of the eliminated compound produced in the irradiation step, (4) a step of calculating the development speed in irradiation of irradiation energy in the step (1), (5) a step of calculating a relationship between the developing speed calculated in the step (4) and the amount of the eliminated compound in the step (3) and (6) a step of evaluating lithography characteristics of the composition containing the copolymer for lithography on the basis of the relationship calculated in the step (5). |
