发明名称 PHOTOSENSITIVE COMPOSITION, PARTITION WALL, BLACK MATRIX, AND METHOD FOR PRODUCING COLOR FILTER
摘要 To provide a photosensitive composition with which partition walls (black matrix) having high sensitivity to light and being excellent in liquid repellency, and pixels excellent in the uniformity in the ink layer thickness, can be formed. A photosensitive composition, which comprises a fluoropolymer (A) having a side chain containing a group such as -(CF2)6F and a side chain containing an ethylenic double bond in one molecule, an alkali soluble photosensitive resin (B), a photopolymerization initiator (C), a black pigment (D), a polymer dispersing agent (E) having basic functional groups, and fine particles (F) other than the black pigment (D).
申请公布号 KR101412857(B1) 申请公布日期 2014.06.26
申请号 KR20097019438 申请日期 2008.04.24
申请人 发明人
分类号 G03F7/004;G03F7/038;H01L51/50;H05B33/10 主分类号 G03F7/004
代理机构 代理人
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