| 摘要 |
<p>A manufacturing process for a touch control electrode structure, comprising the steps of: S1: forming an electrode layer on a substrate; S2: forming a first anti-etching optical layer; S3: etching the electrode layer, wherein the electrode layer located in a non-etching area comprises: more than two first electrode blocks arranged in a first direction, adjacent first electrode blocks being electrically connected via a first conductor; and more than two second electrode blocks arranged in a second direction, the second electrode blocks being respectively arranged on both sides of the first conductor; S4: forming a second anti-etching optical layer, and forming a hollow area corresponding to the second anti-etching optical layer on each of the second electrode blocks; S5: etching the first anti-etching optical layer in the hollow area, so as to form a through hole; and S6: forming a line layer, the line layer being located on the second anti-etching optical layer and being electrically connected to the adjacent second electrode blocks via the hollow area and the through hole. The touch control electrode structure formed using the above-mentioned process has a better visual effect, short processing time and high process efficiency.</p> |
