RESIN, RESIST COMPOSITION AND RESIST PATTERN PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resin suitable for a resist composition that enables production of a negative resist pattern with an excellent focus margin.SOLUTION: A resin includes at least three structural units selected from the group consisting of a structural unit represented by formula (a1-0), a structural unit represented by formula (a1-1), a structural unit represented by formula (a1-2) and a structural unit represented by formula (a1-5), and a structural unit represented by formula (a3-4).