发明名称 Artificial Silica Marble Having Amorphous Patterns and Method for Preparing the Same
摘要 An artificial silica marble comprises a matrix and a line pattern portion. The line pattern portion comprises fine lines having a width of about 50 to about 500 μm and forms a web- or net-like pattern. The line pattern portion divides or partitions the artificial silica marble into a plurality of irregularly shaped pattern portions to form an amorphous pattern in the cross section of the artificial silica marble.
申请公布号 US2014179847(A1) 申请公布日期 2014.06.26
申请号 US201314068045 申请日期 2013.10.31
申请人 Cheil Industries Inc. 发明人 Hwang Cheol Yeon;Son Chang Ho;Jeong Su Sun;Lee Hee Cheol;Kang Han Ju;An Sung Jin
分类号 C04B26/18;B29D99/00 主分类号 C04B26/18
代理机构 代理人
主权项 1. An artificial silica marble comprising a matrix and a line pattern portion, wherein the line pattern portion comprises fine lines having a width of about 50 to about 500 μm and forming a web- or net-like pattern, wherein the line pattern portion divides the artificial silica marble into a plurality of irregularly shaped pattern portions to form an amorphous pattern in the cross section of the artificial silica marble.
地址 Gumi-si KR