发明名称 |
Artificial Silica Marble Having Amorphous Patterns and Method for Preparing the Same |
摘要 |
An artificial silica marble comprises a matrix and a line pattern portion. The line pattern portion comprises fine lines having a width of about 50 to about 500 μm and forms a web- or net-like pattern. The line pattern portion divides or partitions the artificial silica marble into a plurality of irregularly shaped pattern portions to form an amorphous pattern in the cross section of the artificial silica marble. |
申请公布号 |
US2014179847(A1) |
申请公布日期 |
2014.06.26 |
申请号 |
US201314068045 |
申请日期 |
2013.10.31 |
申请人 |
Cheil Industries Inc. |
发明人 |
Hwang Cheol Yeon;Son Chang Ho;Jeong Su Sun;Lee Hee Cheol;Kang Han Ju;An Sung Jin |
分类号 |
C04B26/18;B29D99/00 |
主分类号 |
C04B26/18 |
代理机构 |
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代理人 |
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主权项 |
1. An artificial silica marble comprising a matrix and a line pattern portion, wherein the line pattern portion comprises fine lines having a width of about 50 to about 500 μm and forming a web- or net-like pattern, wherein the line pattern portion divides the artificial silica marble into a plurality of irregularly shaped pattern portions to form an amorphous pattern in the cross section of the artificial silica marble. |
地址 |
Gumi-si KR |